Single wafer megatonic cleaning machine

Megasonic Cleaning Systems

Single wafer megatonic cleaning machine

YMMS-MSC600

Megasonic Cleaning Systems is the use of transducers to emit megahertz high energy sound waves, the solution molecules in the sound wave under the promotion of accelerated motion, with strong sound pressure gradient and sound flow action produced by the high-speed fluid dynamics layer continuous impact, adsorption of fine particles desorption cleaning technology.

  Characteristics  

Megasonic Cleaning Systems does not produce strong cavitation effect, which can avoid damage to the surface of the cleaning object and residual pollutants in the cleaning process. Megabound cleaning efficiency is high, time is short, the use of cleaning agent concentration is low, the consumption of chemical reagents is less, so the level of harm to the environment is low.

 Device Features 

◆ Instrument type signs in the cleaning equipment

◆ Quartz nozzle: mega sound nozzle Angle adjustable multiple flow model (can be selected)

◆ Mega sound cleaning equipment, USES the mega cleaning spray technology, can provide nanoscale wet cleaning

◆ "dry into dry out" step process with the lowest investment and acquisition cost

◆  Nondestructive mega sound cleaning, reagents, PVA scrub

◆  N2 dry, speed can be set up

◆  Full-color touch screen control and friendly man-machine interface

◆ Free collocation with established cleaning process order menu, multistage speed Settings

◆ Set-top type head quarter in purification system

◆ Imported high precision numerical flow control valve

◆ Liquid discharge unit can independently and facility interface docking

◆ Various process recipe stored

◆ Leakage detection alarm device

◆ Emergency DI fixed arm

◆ Equipment frame of outsourcing NPP stainless steel material